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Handbook of silicon semiconductor metrology [Recurso electrónico] / edición, Alain C. Diebold.

Colaborador(es): Tipo de material: TextoTextoIdioma: Inglés Detalles de publicación: New York : Marcel Dekker, 2001Edición: 1a edDescripción: xvi, 874 p. : il. ; 27 cmISBN:
  • 9780203904541
  • 0203904540
Tema(s): Clasificación LoC:
  • TK7871.85 .H3337 2001
Recursos en línea:
Contenidos parciales:
Introduction.-- 1. Silicon Semiconductor Metrology / Alain C.Diebold Transistor Fabrication Metrology.-- 2. Gate Dielectric Metrology / Clive Hayzelden.-- 3. Metrology for ion Implantation / Lawrence ALarson.-- 4. MOS Device Characterization / Eric M. Vogel, Veena Misra.-- 5. Carrier Illumination Characterization of Ultra-Shallow Implants / Peter Borden, Laurie Bechiler, Karen Lingel, and Regina Nijmeijer.-- 6. Modeling of Statistical Manufacturing Sensitivity and of Process Control and Metrology Requirements for a 0.18-μm NMOSFET / Poter MZeitzof.-- On-Chip Interconnect Metrology.-- 7. Overview of Metrology for On-Chip Interconnect / Alam C. Diebold.-- 8. Metrology for On-Chip Interconnect Dielectrics / Alaín C.Diebold, William W.Chism, Thaddeus G.Dziura, Ayman Kanan.-- 9 Thin-Film Metrology Using Impulsive Stimulated Thermal Scattering (ISTS) / Michael Gostein, Matthew Baner, Michael A. Joffe, Alex A. Maznev, Robin Sacco, John A. Rogers, Keith A. Nelson.-- 10. - Metal Interconnect Process Control Using Picosecond Ultrasonics / Alai C Diebold, Robert Stoner.-- 11. Sheet Resistance Measurements of Interconnect Films / Walter H Johnson.-- 12. Characterization of Low-Dielectric Constant Materials / Michael Kiene, Michael Morgen, Jie-Hua Zhao, Chuan Hu, Taiheui Cho, and Paul S.Ho.-- 13. High-Resolution Profilometry for CMP and Etch Metrology / Anna Mathai, Clive Hayzelden.-- Lithography Metrology.-- 14. Critical-Dimension Metrology and the Scanning Electron Microscope / Michael T.Postek, András E. Vladár.-- 15.Scanned Probe Microscope Dimensional Metrology / Herschel M.Marchman, Joseph E.Griffith.-- 16.Electrical CD Metrology and Related Reference Materials / Michael W.Cresswell, Richard A. Allen.-- 17.Metrology of Image Placement / Alexander Starikov.-- 18.Scatterometry for Semiconductor Metrology / Christopher J.Raymond.-- Defect Detection and Characterization.-- 19.Unpatterned Wafer Defect Detection / Po-Fu Huang, Yuri S.Uritsky, C.R.Brundle.-- 20.Particle and Defect Characterization / C.R.Brundle, Yuri S.Uritsky.-- 21.Calibration of Particle Detection Systems / John C.Stover.-- Sensor-Based Metrology.-- 22.In Situ Metrology / Gabriel G.Barna, Bradley Van Eck, Jimmy W.Hosch.-- Data Management.-- 23.Metrology Data Management and Information Systems / Kenneth W.Tobin, Jr., Leonard Neiberg.-- Electrical Measurement-Based Statistical Metrology.-- 24.Statistical Metrology, with Applications to Interconnect and Yield Modeling / Duane S.Boning.-- Overviews of Key Measurement and Calibration Technology.-- 25.Physics of Optical Metrology of Silicon-Based Semiconductor Devices / Gerald E.Jellison, Jr..-- 26.Ultraviolet, Vacuum Ultraviolet, and Extreme Ultraviolet Spectroscopic Reflectometry and Ellipsometry / J.L.Stehle, P.Boher, C.Defranoux, P.Evrard, J.P.Piel.-- 27.Analysis of Thin-Layer Structures by X-Ray Reflectometry / Richard D.Deslattes and Richard J.Matyi.-- 28.Ion Beam Methods / Wolf-Hartmut Schulte, Brett Busch, Eric Garfunkel, Torgny Gustafsson.-- 29.Electron Microscopy-Based Measurement of Feature Thickness and Calibration of Reference Materials / Alain C.Diebold.-- 30.Status of Lithography Metrology as of the End of 2000 / Alain C.Diebold.
Resumen: The Handbook of Silicon Semiconductor Metrology is designed to serve as a reference to both the metrology and processing communities. The volume is intended for a broad audience, from research to development and manufacturing. Whenever possible, chapter authors have provided a description of the science of the measurement along with applications to the most recent materials and processes. Another appropriate title for this book would be The Science and Technology of Silicon IC Metrology. The more one knows about the science behind measurement technology, the better one is able to ensure that a given metrology method will provide useful and correct information. It can serve as an advanced reference and text for those studying the processes used in silicon integrated circuit (IC) manufacturing.
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Introduction.--
1. Silicon Semiconductor Metrology / Alain C.Diebold

Transistor Fabrication Metrology.--
2. Gate Dielectric Metrology / Clive Hayzelden.--
3. Metrology for ion Implantation / Lawrence ALarson.--
4. MOS Device Characterization / Eric M. Vogel, Veena Misra.--
5. Carrier Illumination Characterization of Ultra-Shallow Implants / Peter Borden, Laurie Bechiler, Karen Lingel, and Regina Nijmeijer.--
6. Modeling of Statistical Manufacturing Sensitivity and of Process Control and Metrology Requirements for a 0.18-μm NMOSFET / Poter MZeitzof.--

On-Chip Interconnect Metrology.--
7. Overview of Metrology for On-Chip Interconnect / Alam C. Diebold.--
8. Metrology for On-Chip Interconnect Dielectrics / Alaín C.Diebold, William W.Chism, Thaddeus G.Dziura, Ayman Kanan.--
9 Thin-Film Metrology Using Impulsive Stimulated Thermal Scattering (ISTS) / Michael Gostein, Matthew Baner, Michael A. Joffe, Alex A. Maznev, Robin Sacco, John A. Rogers, Keith A. Nelson.--
10. - Metal Interconnect Process Control Using Picosecond Ultrasonics / Alai C Diebold, Robert Stoner.--
11. Sheet Resistance Measurements of Interconnect Films / Walter H Johnson.--
12. Characterization of Low-Dielectric Constant Materials / Michael Kiene, Michael Morgen, Jie-Hua Zhao, Chuan Hu, Taiheui Cho, and Paul S.Ho.--
13. High-Resolution Profilometry for CMP and Etch Metrology / Anna Mathai, Clive Hayzelden.--

Lithography Metrology.--
14. Critical-Dimension Metrology and the Scanning Electron Microscope / Michael T.Postek, András E. Vladár.--
15.Scanned Probe Microscope Dimensional Metrology / Herschel M.Marchman, Joseph E.Griffith.--
16.Electrical CD Metrology and Related Reference Materials / Michael W.Cresswell, Richard A. Allen.--
17.Metrology of Image Placement / Alexander Starikov.--
18.Scatterometry for Semiconductor Metrology / Christopher J.Raymond.--

Defect Detection and Characterization.--
19.Unpatterned Wafer Defect Detection / Po-Fu Huang, Yuri S.Uritsky, C.R.Brundle.--
20.Particle and Defect Characterization / C.R.Brundle, Yuri S.Uritsky.--
21.Calibration of Particle Detection Systems / John C.Stover.--

Sensor-Based Metrology.--
22.In Situ Metrology / Gabriel G.Barna, Bradley Van Eck, Jimmy W.Hosch.--

Data Management.--
23.Metrology Data Management and Information Systems / Kenneth W.Tobin, Jr., Leonard Neiberg.--

Electrical Measurement-Based Statistical Metrology.--
24.Statistical Metrology, with Applications to Interconnect and Yield Modeling / Duane S.Boning.--

Overviews of Key Measurement and Calibration Technology.--
25.Physics of Optical Metrology of Silicon-Based Semiconductor Devices / Gerald E.Jellison, Jr..--
26.Ultraviolet, Vacuum Ultraviolet, and Extreme Ultraviolet Spectroscopic Reflectometry and Ellipsometry / J.L.Stehle, P.Boher, C.Defranoux, P.Evrard, J.P.Piel.--
27.Analysis of Thin-Layer Structures by X-Ray Reflectometry / Richard D.Deslattes and Richard J.Matyi.--
28.Ion Beam Methods / Wolf-Hartmut Schulte, Brett Busch, Eric Garfunkel, Torgny Gustafsson.--
29.Electron Microscopy-Based Measurement of Feature Thickness and Calibration of Reference Materials / Alain C.Diebold.--
30.Status of Lithography Metrology as of the End of 2000 / Alain C.Diebold.

The Handbook of Silicon Semiconductor Metrology is designed to serve as a reference to both the metrology and processing communities. The volume is intended for a broad audience, from research to development and manufacturing. Whenever possible, chapter authors have provided a description of the science of the measurement along with applications to the most recent materials and processes. Another appropriate title for this book would be The Science and Technology of Silicon IC Metrology. The more one knows about the science behind measurement technology, the better one is able to ensure that a given metrology method will provide useful and correct information. It can serve as an advanced reference and text for those studying the processes used in silicon integrated circuit (IC) manufacturing.

Área de Ciencias Básicas e Ingenierías

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